News

We would like to invite you to visit our exhibit booth at Photonics West Exhibition 2026 in the Moscone Center, San Francisco, California USA on 20-22 Jan. 2026.
Our sales and technical staff will be at our booth to discuss your current and future requirements and we’d be pleased to have a private meeting with you on-site anytime at your convenience.

Location: The Moscone Center
747 Howard Street San Francisco, USA 94103
Dates and Hours: Tuesday 20th January, 10:00 am to 5:00 pm
　　　　　　　　Wednesday 21st January, 10:00 am to 5:00 pm
　　　　　　　　Thursday 22nd January, 10:00 am to 4:00 pm
Nalux’s Booth: #1360

Featured technologies
・Metalenses
・3D Industrial Endoscope
・Light flow guide
・Polymer Waveguide for AR glasses
・SCOI (Spectral Characteristics Optimized Imaging)
・Microstructures
・Glass optical elements
・Plastic Optical Components
・Optical Design Services

SPIE Photonics West Exhibition 2026 website
SPIE Photonics West Exhibition: 20 – 22 January 2026
Nalux Co., Ltd. Exhibitor Page
Nalux Co., Ltd. : SPIE Photonics West 2026 Exhibition

【Request for a booth meeting? Have a face-to-face design discussion on Nalux booth!】
If you would like to have a private meeting during the exhibition　
Please send the request through our inquiry form Inquiries | NALUX CO., Ltd.

【Presentation Notice】
We are also pleased to share that our engineers will be giving both an oral presentation and a poster presentation at the co-located conference.
We would be delighted if you could attend those sessions as well.

Oral Presentation
Date/Time: January 21, 2026 (Wed) 9:20–9:40 PST
Title: A simplified guided-mode-resonant wavelength filter with ultra-low aspect ratio for polarization-insensitive performance at 45-degree incidence
Details: A simplified guided-mode-resonant wavelength filter with ultra-low aspect ratio for polarization-insensitive performance at 45-degree incidence | SPIE Photonics West

Poster Presentation
Date/Time: January 18, 2026 (Sun) 17:30–18:30 PST
Title: Enhancing ophthalmic surgical visibility under low dye staining by spectral characteristics optimized imaging
Details: Enhancing ophthalmic surgical visibility under low dye staining by spectral characteristics optimized imaging | SPIE Photonics West

For the meeting request on SPIE Photonics West Exhibition booth, please send the inquiry bellow.
Inquiries | NALUX CO., Ltd.